发明名称 VAPOR DEPOSITION POLYMERIZED FILM-FORMING APPARATUS AND METHOD FOR FORMING VAPOR DEPOSITION POLYMERIZED FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a vapor deposition polymerized film-forming apparatus which can obtain the change in the composition and film thickness of a vapor deposition polymerized film while continuously forming the vapor deposition polymerized film. <P>SOLUTION: The apparatus is configured such that: a reflection type infrared spectrophotometer 86 including an infrared light source 88, a spectral means, a detector 90 and an optical system 92 is installed; a collector mirror 124 of collecting infrared light separated by the spectral means on a vapor deposition polymerized film, and reflection mirrors 126, 122, 118 further reflecting the reflection light at the focal point on the vapor deposition polymerized film and introducing the same into the detector 90 are provided at the optical system 92; and further, the collector mirror 124 is arranged at a position capable of changing the position of the focal point of the infrared light on the vapor deposition polymerized film to the longitudinal direction of the base material film, with the transfer of the base material film. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013112867(A) 申请公布日期 2013.06.10
申请号 JP20110261191 申请日期 2011.11.30
申请人 KOJIMA PRESS INDUSTRY CO LTD 发明人 HAYAKAWA MUNETAKA;ITO KAORU;NOGUCHI MASUMI
分类号 C23C14/24;H01G4/015;H01G4/18 主分类号 C23C14/24
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