CIRCUIT INTEGRE A DISPOSITIF DE TYPE FET SANS JONCTION ET A DEPLETION

摘要

The invention relates to a method for producing an integrated circuit (100), comprising at least the following steps in the following order: a) producing at least one electronic MOSD circuit (104) and/or at least one level of electric interconnections (116, 120) on a substrate (102); uniformly implanting dopants in at least a portion of a crystalline semiconductor layer (125); c) thermally activating the dopants implanted in the portion of the crystalline semiconductor layer; d) rigidly connecting the crystalline semiconductor layer to the substrate; and e) producing at least one junctionless depletion-mode FET device (126) including a part (130, 132, 134) of the portion of the crystalline semiconductor layer.