发明名称 DEVICE FOR DRYING SUBSTRATES
摘要 The method involves impressing support with substrates (T) at a level of treatment liquid. The support is lifted at predetermined angle in vertical direction. The substrates are lifted out of the treatment liquid so that the treatment liquid flows off completely from the surface of the substrates. The plane of the support is horizontally aligned when impressing in the treatment liquid. An independent claim is included for a device for drying substrate.
申请公布号 KR20130003387(U) 申请公布日期 2013.06.07
申请号 KR20120011055U 申请日期 2012.11.29
申请人 发明人
分类号 H01L21/302 主分类号 H01L21/302
代理机构 代理人
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