发明名称 ALIGNMENT METHOD BETWEEN RESIN FILM AND SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide an alignment method which can align an odd-shaped pattern of a resin film with an intended position of a substrate even when the resin film undergoes change of form. <P>SOLUTION: An alignment method of aligning a resin film 11 having a micro odd-shaped pattern formed on a surface and a substrate 15 having a photo-curing resin layer 16 on which the odd-shaped pattern is to be transferred when bonding the resin film 11 with the substrate 15, comprises a step of extending the resin film 11 of a polygonal planar shape in a planar direction while holding the resin film 11 at edges but not at vertexes. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013110196(A) 申请公布日期 2013.06.06
申请号 JP20110252510 申请日期 2011.11.18
申请人 BRIDGESTONE CORP 发明人 SUZUKI TAKAHIRO;AKAMA HIDEHIRO
分类号 H01L21/027;B29C33/42;B29C39/44;B29C59/02;G11B5/84;G11B7/26 主分类号 H01L21/027
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