发明名称 |
LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND COMPUTER PROGRAM |
摘要 |
The invention relates to intensity values for a plurality of beams used to irradiate a plurality of locations on a target are determined with reference to the position and/or rotation of the locations. Also provided is an associated lithographic or exposure apparatus, an associated device manufacturing method and an associated computer program. |
申请公布号 |
WO2013079285(A1) |
申请公布日期 |
2013.06.06 |
申请号 |
WO2012EP71927 |
申请日期 |
2012.11.06 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
TINNEMANS, PATRICIUS;BLEEKER, ARNO;LOOPSTRA, ERIK |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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