发明名称 REFLOW FILM, METHOD FOR FORMING SOLDER BUMP, METHOD FOR FORMING SOLDER JOIN, AND SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide, by unevenly distributing a solder constituent on an electrode of a substrate by means of self-structuring thereof, a reflow film which is excellent in self stability, transportability, and handleability in use, and which allows selective formation of a solder bump or solder join only on the electrode, and to provide a simple and convenient method for forming a solder bump or solder join by use of the reflow film, a solder bump having less voids and smaller variation thereby formed, and a substrate with such solder bumps. <P>SOLUTION: The reflow film comprises, in a solvent: a meltable thermoplastic resin; and solder particles. The solder particles are dispersed in the film. The method for forming a solder bump comprises: (a) the step of putting the reflow film on an electrode face of a substrate; (b) the step of further putting a plat plate thereon and then fixing them; (c) the step of heating them; and (d) the step of melting and removing the reflow film. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013110402(A) 申请公布日期 2013.06.06
申请号 JP20120236847 申请日期 2012.10.26
申请人 HITACHI CHEMICAL CO LTD 发明人 MIYAUCHI KAZUHIRO;SUZUKI NAOYA;TAKANO MARE;YAMASHITA YUKIHIKO
分类号 H01L21/60;H05K1/18;H05K3/34;H05K3/36 主分类号 H01L21/60
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