| 发明名称 |
DEPOSITION DEVICE AND INSTALLATION METHOD OF VAPORIZER |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a deposition apparatus which eases a height limit for installation in a building when installed and enables easy maintenance, and to provide an installation method of a vaporizer. <P>SOLUTION: A deposition apparatus is composed of: a liquid material supply system for deposition; a vaporizer 30a for mixing a liquid material with a carrier gas and vaporizing the mixture; a deposition chamber 40a where a material vaporization gas discharged from the vaporizer 30a is flowed to a substrate to deposit a film; and a material vaporization gas supply pipeline 50a for supplying the gas from the vaporizer 30a to the deposition chamber. The vaporizer 30a is arranged in parallel with a side surface of the deposition chamber 40a. <P>COPYRIGHT: (C)2013,JPO&INPIT |
| 申请公布号 |
JP2013110306(A) |
申请公布日期 |
2013.06.06 |
| 申请号 |
JP20110255083 |
申请日期 |
2011.11.22 |
| 申请人 |
WATANABE SHOKO:KK;TODA MASAYUKI |
发明人 |
TODA MASAYUKI;UMEDA MASARU |
| 分类号 |
H01L21/31;C23C16/44;C23C16/448;H01L21/205 |
主分类号 |
H01L21/31 |
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