发明名称 APPARATUS FOR MANUFACTURING SUBSTRATE
摘要 Disclosed herein is an apparatus for manufacturing a substrate. The apparatus for manufacturing a substrate includes: a reaction gas ejector ejecting reaction gas; a lift pin supporting the substrate and having a header contacting a rear surface of the substrate; and a support chuck having a lift pin insertion unit inserted with the lift pin and moving vertically and including a ring in a header insertion portion into which the header is inserted in the lift pin insertion unit.
申请公布号 US2013139753(A1) 申请公布日期 2013.06.06
申请号 US201213409791 申请日期 2012.03.01
申请人 KANG JOON SEOK;SHIN SEUNG WAN;SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 KANG JOON SEOK;SHIN SEUNG WAN
分类号 C23C16/458;C23C16/50 主分类号 C23C16/458
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