发明名称 CHARGED PARTICLE BEAM GENERATION DEVICE AND CHARGED PARTICLE BEAM GENERATION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To stably generate fine charged particle beams. <P>SOLUTION: An ion beam generation device 1 comprises: a gas source 7 for generating a gas flow; a capillary tube 9 whose base end 21 is connected to the gas source and whose tip part 25 is tapered; a plate-like electrode 19 provided to surround a side face 35 of the capillary tube 9 from the outside; a pulse voltage source 11 for applying a pulse voltage to the plate-like electrode 19; and a bias voltage source 13 for applying a negative direct-current bias to a target T that is an ion beam radiation target. Plural side holes 37a, 37b are formed on a side face 36 of the capillary tube 9. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013109961(A) 申请公布日期 2013.06.06
申请号 JP20110254205 申请日期 2011.11.21
申请人 NATIONAL UNIV CORP SHIZUOKA UNIV 发明人 NAGATSU MASAAKI
分类号 H05H1/30;C23C14/32;H01L21/3065;H05H1/24 主分类号 H05H1/30
代理机构 代理人
主权项
地址