发明名称 |
CHARGED PARTICLE BEAM GENERATION DEVICE AND CHARGED PARTICLE BEAM GENERATION METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To stably generate fine charged particle beams. <P>SOLUTION: An ion beam generation device 1 comprises: a gas source 7 for generating a gas flow; a capillary tube 9 whose base end 21 is connected to the gas source and whose tip part 25 is tapered; a plate-like electrode 19 provided to surround a side face 35 of the capillary tube 9 from the outside; a pulse voltage source 11 for applying a pulse voltage to the plate-like electrode 19; and a bias voltage source 13 for applying a negative direct-current bias to a target T that is an ion beam radiation target. Plural side holes 37a, 37b are formed on a side face 36 of the capillary tube 9. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013109961(A) |
申请公布日期 |
2013.06.06 |
申请号 |
JP20110254205 |
申请日期 |
2011.11.21 |
申请人 |
NATIONAL UNIV CORP SHIZUOKA UNIV |
发明人 |
NAGATSU MASAAKI |
分类号 |
H05H1/30;C23C14/32;H01L21/3065;H05H1/24 |
主分类号 |
H05H1/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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