RETICLE ASSEMBLY, LITHOGRAPHIC APPARATUS, USE THEREOF IN LITHOGRAPHIC PROCESS, AND METHOD OF PROJECTING TWO OR MORE IMAGE FIELDS IN SINGLE SCANNING MOVEMENT OF LITHOGRAPHIC PROCESS
摘要
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus comprising a reticle assembly which can improve efficiency in scanning movement. <P>SOLUTION: A reticle assembly MT is used in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second target portion on a substrate. The reticle assembly MT is arranged to hold a first reticle MA1 having the first image field and a second reticle MA2 having the second image field such that the distance between the first and second image fields corresponds to the distance between the first and the second target portions. <P>COPYRIGHT: (C)2013,JPO&INPIT
