| 摘要 |
<P>PROBLEM TO BE SOLVED: To generate EUV light stably. <P>SOLUTION: A chamber device may include a chamber in which EUV light is generated from a predetermined region thereof, a condensation mirror disposed in the chamber and condensing the EUV light generated from the predetermined region, and at least one etching gas supply section supplying an etching gas capable of etching debris adhering to the condensation mirror. The condensation mirror may include at least one first through hole opening to penetrate the condensation mirror in a region of the mirror surface thereof deviated from the central part. The condensation mirror may be fixed in the chamber so that the at least one first through hole is located in a region substantially corresponding to an obscuration region. At least one etching gas supply section may be disposed in the first through hole. <P>COPYRIGHT: (C)2013,JPO&INPIT |
