| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus which performs downward vapor deposition without storing a molten vapor deposition material in a reservoir etc. <P>SOLUTION: The vapor deposition apparatus includes: a vacuum chamber 10; a substrate stage 24 which is arranged inside the vacuum chamber and on which a substrate 1 is placed; a resistance heating board 31 which is arranged above the substrate stage inside the vacuum chamber and which has a heating surface on the undersurface 31a; and a linear vapor deposition material supply part 40 which is arranged inside the vacuum chamber and which brings the tip of the linear vapor deposition material 3 into contact with the heating surface on the undersurface of the resistance heating board. <P>COPYRIGHT: (C)2013,JPO&INPIT |
