发明名称 JIG FOR USE IN ETCHING AND CHEMICAL LIFT-OFF APPARATUS INCLUDING THE SAME
摘要 A jig for use in etching supports an etching target while an etching process is performed and surrounds a remaining region of the etching target except for a portion of the etching target, so as to expose the portion of the etching target. Accordingly, a stable support of the etching target during the etching process may be provided, and thus an etching of an undesired region may be prevented, and a stable production yield may be accomplished.
申请公布号 US2013139966(A1) 申请公布日期 2013.06.06
申请号 US201213619521 申请日期 2012.09.14
申请人 CHAE SU-HEE;KIM JUN-YOUN;PARK YOUNG-SOO;LEE JAE-WON;TAK YOUNG-JO;HONG HYUN-GI;SAMSUNG ELECTRONICS CO., LTD. 发明人 CHAE SU-HEE;KIM JUN-YOUN;PARK YOUNG-SOO;LEE JAE-WON;TAK YOUNG-JO;HONG HYUN-GI
分类号 H01L21/306 主分类号 H01L21/306
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