发明名称 |
JIG FOR USE IN ETCHING AND CHEMICAL LIFT-OFF APPARATUS INCLUDING THE SAME |
摘要 |
A jig for use in etching supports an etching target while an etching process is performed and surrounds a remaining region of the etching target except for a portion of the etching target, so as to expose the portion of the etching target. Accordingly, a stable support of the etching target during the etching process may be provided, and thus an etching of an undesired region may be prevented, and a stable production yield may be accomplished.
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申请公布号 |
US2013139966(A1) |
申请公布日期 |
2013.06.06 |
申请号 |
US201213619521 |
申请日期 |
2012.09.14 |
申请人 |
CHAE SU-HEE;KIM JUN-YOUN;PARK YOUNG-SOO;LEE JAE-WON;TAK YOUNG-JO;HONG HYUN-GI;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHAE SU-HEE;KIM JUN-YOUN;PARK YOUNG-SOO;LEE JAE-WON;TAK YOUNG-JO;HONG HYUN-GI |
分类号 |
H01L21/306 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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