发明名称 DRY FILM RESIST THINNING PROCESSING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a dry film resist thinning processing method that can uniformly reduce the thicknesses of dry film resists. <P>SOLUTION: The dry film resist thinning processing method includes: a processing step of processing a dry film resist adhered on a substrate with a processing solution; and a step of removing an unnecessary part of the dry film resist on the surface after performing the processing step. In the method, the unnecessary part of the dry film resist is processed with a potassium salt solution with a concentration higher than that of the processing solution before being removed. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013109038(A) 申请公布日期 2013.06.06
申请号 JP20110251948 申请日期 2011.11.17
申请人 MITSUBISHI PAPER MILLS LTD 发明人 YAMANE KENGO;TOYODA YUJI
分类号 G03F7/38;H05K3/06 主分类号 G03F7/38
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