| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a holding material for a single side polishing which does not change a surface shape giving an influence on the quality of a matter to be polished after polished even if machining processes are added from an initial stage in the matter to be polished such as a glass substrate for a liquid crystal display, can thereby maintain fixed polishing quality and enhance the surface flatness of a holding surface giving the influence on the quality of the matter to be polished, and can firmly hold the matter to be polished during polishing even if the matter to be polished is of a large type and an extremely thin type, and can be safely and easily peeled after polishing. <P>SOLUTION: The method for manufacturing the holding material for single side polishing includes a step for manufacturing a resin sheet having a foam layer and a surface by dense foaming by a wet film forming method, and a step for thermally forming the resin sheet at a flow starting temperature of the material which constitutes the resin sheet or higher by supplying the resin sheet to a dimple roll which has a projection on the surface thereof and can be heated to perform the pressure contact of the surface part by the dense foaming of the resin sheet. <P>COPYRIGHT: (C)2013,JPO&INPIT |
