| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a minute uneven pattern on a photocurable resin using an intermediate stamper in a nanoimprint process method, with mold releasability between the intermediate stamper and the photocurable resin, to which the minute uneven pattern is transferred, being improved, and an apparatus for use in the method. <P>SOLUTION: An uneven pattern formation method comprises the steps of: transferring a minute uneven pattern formed on a surface of a mold 34 to a photocurable transfer layer 31, which is made of a photocurable composition that is deformable through application of pressure, of a photocurable transfer sheet 30 to thereby form a minute inverse uneven pattern on the transfer layer 31; and transferring the inverse uneven pattern to a photocurable resin layer 41 made of a photocurable resin composition on a substrate 40 to thereby form an uneven pattern, which is the same as that of the mold 34, on the photocurable resin layer 41, wherein UV ozone treatment is performed on the transfer layer 31c on which the inverse uneven pattern is formed. <P>COPYRIGHT: (C)2013,JPO&INPIT |
