发明名称 |
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid processing apparatus which conducts liquid processing and dry processing at different height positions. <P>SOLUTION: A liquid processing apparatus includes: a substrate holding part holding a substrate; a rotation driving part rotating the substrate holding part; a substrate holding part lifting member moving up and down the substrate holding part; a process liquid supply part supplying a process liquid to the substrate; a liquid receiving cup enclosing the substrate when the process liquid is supplied to the substrate; and a dry cup which is positioned above the substrate and the liquid receiving cup when the process liquid is supplied to the substrate, the dry cup enclosing the substrate and positioned above the liquid receiving cup when the substrate is dried. The above object is achieved by the liquid processing apparatus. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013110278(A) |
申请公布日期 |
2013.06.06 |
申请号 |
JP20110254269 |
申请日期 |
2011.11.21 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
NAGAMINE SHUICHI;HASHIMOTO YUSUKE |
分类号 |
H01L21/304;H01L21/027;H01L21/306 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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