发明名称 MONOLITHIC SEMICONDUCTOR SWITCHES AND METHOD FOR MANUFACTURING
摘要 A semiconductor device and method are disclosed. One embodiment provides a semiconductor die with a first n-type channel FET and a second n-type channel FET. A source of the first n-type channel FET and a drain of the second n-type channel FET are electrically coupled to at least one contact area at a first side. A drain of the first n-type channel FET, a gate of the first n-type channel FET, a source of the second n-type channel FET and the gate of the second n-type channel FET are electrically coupled to contact areas at a second side. Contact areas of the first n-type channel FET and the second n-type channel FET are electrically separated from each other.
申请公布号 US2013140673(A1) 申请公布日期 2013.06.06
申请号 US201213487999 申请日期 2012.06.04
申请人 HAEBERLEN OLIVER;RIEGER WALTER;VIELEMEYER MARTIN;GOERGENS LUTZ;POELZL MARTIN;PAOLUCCI MILKO;SCHOISWOHL JOHANNES;KRUMREY JOACHIM;INFINEON TECHNOLOGIES AUSTRIA AG 发明人 HAEBERLEN OLIVER;RIEGER WALTER;VIELEMEYER MARTIN;GOERGENS LUTZ;POELZL MARTIN;PAOLUCCI MILKO;SCHOISWOHL JOHANNES;KRUMREY JOACHIM
分类号 H01L23/495 主分类号 H01L23/495
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