| 发明名称 |
MASK |
| 摘要 |
A light irradiation apparatus and a method of manufacture a photo-aligning layer are disclosed. A mask included in a light irradiation apparatus according to one embodiment is configured to irradiate the light having straightness at a high level of illumination to a subject that is apart from the mask with a certain distance. A photo-aligning layer with a desired alignment pattern can be fabricated using the mask.
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| 申请公布号 |
US2013143007(A1) |
申请公布日期 |
2013.06.06 |
| 申请号 |
US201213356463 |
申请日期 |
2012.01.23 |
| 申请人 |
KIM SIN YOUNG;HONG KYUNG KI;YOON HYUK;JU WON CHEUL;CHO YONG II;PARK MOON SOO;KO DONG HO;RYU SU YOUNG;LG CHEM, LTD. |
发明人 |
KIM SIN YOUNG;HONG KYUNG KI;YOON HYUK;JU WON CHEUL;CHO YONG II;PARK MOON SOO;KO DONG HO;RYU SU YOUNG |
| 分类号 |
G03F1/00;B32B3/10;G03B27/42;G03F1/52;G03F7/20;G03F7/24 |
主分类号 |
G03F1/00 |
| 代理机构 |
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