发明名称 |
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE |
摘要 |
<p>A pattern forming method including: (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) having a repeating unit having a group generating a polar group upon being decomposed by the action of an acid, and a repeating unit having an aromatic group, a compound (B) generating an acid upon irradiation with actinic rays or radiation, and a solvent (C); (ii) exposing the film; and (iii) developing the exposed film using a developer including an organic solvent to form a negative tone pattern, wherein the resin (A) is a resin having a repeating unit having a naphthyl group, and the like, and/or the actinic ray-sensitive or radiation-sensitive resin composition contains a compound (D) having a naphthalene ring, and the like.</p> |
申请公布号 |
WO2013081168(A1) |
申请公布日期 |
2013.06.06 |
申请号 |
WO2012JP81427 |
申请日期 |
2012.11.28 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KATO, KEITA;SHIRAKAWA, MICHIHIRO;TAKAHASHI, HIDENORI;KAMIMURA, SOU |
分类号 |
G03F7/039;C08F212/00;C08F220/12;G03F7/038;G03F7/32;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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