发明名称 ANTIMICROBIAL COMPOSITION INCLUDING A RESIDUAL BARRIER FILM
摘要 This disclosure describes example antimicrobial compositions that may be used in combination with IV port cleansing caps, protective caps, or nasal decolonizer devices. According to another implementations, the disclosure describes that the antimicrobial composition may provide an indication that it has come into contact with a contaminant by bubbling or foam on a surface that is being cleaned. According to another implementation, the disclosure describes that the antimicrobial composition may leave a residual film or barrier to inhibit the recontamination of a surface that has been cleaned.
申请公布号 CA2856535(A1) 申请公布日期 2013.06.06
申请号 CA20122856535 申请日期 2012.11.28
申请人 HYPROTEK, INC. 发明人 TENNICAN, PATRICK O.
分类号 A61L31/14;A61L29/14 主分类号 A61L31/14
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