发明名称 |
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
A method for manufacturing a semiconductor device having a cooling mechanism comprises a modified region forming step of converging a laser light at a sheet-like object to be processed made of silicon so as to form a modified region within the object along a line to form a modified region, an etching step of anisotropically etching the object after the modified region forming step so as to advance the etching selectively along the first modified region and form a flow path for circulating a coolant as a cooling mechanism within the object, and a functional device forming step of forming a functional device on one main face side of the object. |
申请公布号 |
EP2599579(A1) |
申请公布日期 |
2013.06.05 |
申请号 |
EP20110812309 |
申请日期 |
2011.07.19 |
申请人 |
HAMAMATSU PHOTONICS K.K. |
发明人 |
SHIMOI HIDEKI;ARAKI KEISUKE |
分类号 |
H01L23/473;B23K26/00;B23K26/38 |
主分类号 |
H01L23/473 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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