| 摘要 |
<p>The invention relates to an inspection system (1) for inspecting flat photosensitive semiconductor objects, such as wafers, solar cells or intermediate stages thereof, said inspection system (1) comprising:
transport means (3) for transporting the flat objects (2) within a transport path (6) in a transport direction (7);
imaging means (8) for imaging the leading edges (2a) and/or trailing edges (2b) of the flat objects (2) within the transport path (6) from at least one observation optical path (9, 19);
a mirror arrangement (10) having at least one mirror surface (11) deflecting the observation optical path (9);
wherein the mirror arrangement (10) is arranged above or beneath the transport path (6) and extends transversely to the transport direction (7),
and wherein the observation optical path section (9a) that extends from the transport path (6) to the mirror surface (11) encloses an observation angle (±) with the transport direction (7).</p> |
