发明名称 SUPPORT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.
摘要 A support for an object having a support surface configured to support the object; wherein the support surface includes a main part and a moveable part, the moveable part of the support surface being moveable between a retracted position in which the moveable part of the support surface is adapted to be substantially in the same plane as the main part of the support surface and an extended position in which the moveable part of the support surface protrudes from the plane of the main part of the support surface.
申请公布号 NL2009689(A) 申请公布日期 2013.06.05
申请号 NL20122009689 申请日期 2012.10.24
申请人 ASML NETHERLANDS B.V. 发明人 GILISSEN NOUD;CUIJPERS MARTINUS;FIEN MENNO;SIJBEN ANKO;SMEETS MARTIN
分类号 G03F7/20;H01L21/683 主分类号 G03F7/20
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