SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A substrate processing apparatus is provided to prevent warpage by using susceptor support units for holding a susceptor. CONSTITUTION: A process chamber(100) has a process space for treating a substrate. A susceptor(130) is installed in the process chamber. The susceptor includes a substrate placed by a tray. Susceptor support units(200) hold the bottom surface of the susceptor. The susceptor support units move up and down to elevate the susceptor.