发明名称 |
Antenna for plasma processor and apparatus |
摘要 |
An antenna includes excitation terminals responsive to an RF source to supply an RF electromagnetic field to a plasma that processes a workpiece in a vacuum chamber. The coil includes a transformer having a primary winding coupled to the excitation terminals and a multi-turn plasma excitation secondary winding connected in series with a capacitor.
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申请公布号 |
US8454794(B2) |
申请公布日期 |
2013.06.04 |
申请号 |
US201213524734 |
申请日期 |
2012.06.15 |
申请人 |
HOWALD ARTHUR M.;KUTHI ANDRAS;LAM RESEARCH CORPORATION |
发明人 |
HOWALD ARTHUR M.;KUTHI ANDRAS |
分类号 |
H01L21/306;C23C16/00;H01J37/32 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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