| 摘要 |
PURPOSE: An apparatus for cleaning an OLED deposition mask is provided to reduce cleaning time by using a process bath for melting or burning an organic compound. CONSTITUTION: A melting furnace(20) produces melted NaOH. A process bath(10) receives the melted NaOH from a first check valve(30) and stores the melted NaOH. The process bath provides a space for cleaning a mask. A first pressure device pressurizes nitrogen or purified air in the melting furnace. The first pressure device supplies the melted NaOH to the process bath. |
