发明名称 APPARATUS FOR FORMING CIGS LAYER
摘要 <p>PURPOSE: An apparatus for forming a CIGS layer is provided to uniformly supply an atmospheric gas of a chamber to each substrate by circulating the atmospheric gas of the chamber between one side and the other side of a body. CONSTITUTION: One side of a body(110) is opened. The body has a cylindrical shape. A door(140) is rotatably installed on one side of the body and opens or closes a chamber. A boat(120) loads a plurality of substrates(50). The boat is loaded on or unloaded from the chamber. A plurality of heaters(130) heat an atmospheric gas of the chamber. A fan(150) makes the atmospheric gas of the chamber flow from one side to the other side of the body along the inner side of the body.</p>
申请公布号 KR20130057197(A) 申请公布日期 2013.05.31
申请号 KR20110122995 申请日期 2011.11.23
申请人 TERASEMICON CORPORATION 发明人 LEE, KYUNG HO
分类号 H01L31/18;H01L31/0445 主分类号 H01L31/18
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