发明名称 |
COMPONENTS OF PLASMA PROCESSING CHAMBERS HAVING TEXTURED PLASMA RESISTANT COATINGS |
摘要 |
<p>COMPONENTS OF PLASMA PROCESSING CHAMBERS HAVING TEXTURED PLASMA RESISTANT COATINGSA component of a plasma processing chamber includes a three dimensional body having a highly dense plasma resistant coating thereon wherein a plasma exposed surface of the coating has a texture which inhibits particle generation from film buildup on the plasma exposed surface. The component can be a window of an inductively coupled plasma reactor wherein the window includes a textured yttria coating. The texture can be provided by contacting the plasma exposed surface with a polishing pad having a grit size effective to provide intersecting scratches with a depth of 1 to 2 microns.FIG. 1</p> |
申请公布号 |
SG189627(A1) |
申请公布日期 |
2013.05.31 |
申请号 |
SG20120073474 |
申请日期 |
2012.10.01 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
TOM STEVENSON;HONG SHIH;ROBERT G. O'NEILL;TAE WON KIM;RAPHAEL CASAES;YAN FANG |
分类号 |
|
主分类号 |
|
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|