| 摘要 |
PURPOSE: A method for controlling a temperature of a substrate and a substrate processing apparatus are provided to adaptively control the temperature of the substrate by individually controlling a gas stream which is independently supplied to the plurality of substrates according to the substrates. CONSTITUTION: A reaction chamber(100) includes a chamber body and a top lead to open or close the top opening of the chamber body. A substrate support unit(200) includes a satellite(210) to mount a plurality of substrates(220). A temperature measuring unit(300) measures the temperatures of the plurality of substrates received in the satellite. A gas supply unit independently supplies a gas to each substrate. A control unit(500) controls the flow of the gas to form a gas stream. [Reference numerals] (500) Control unit |
