| 摘要 |
<p>Abstract Cleaning Apparatus, Measurement Method and Calibration Method5 Subject: To provide a cleaning apparatus capable of cleaning substrates effectively and stably, a method for calibrating a device for measuring the concentration of a dissolved gas used in the cleaning apparatus, and a measurement method for measuring the concentration of a dissolved gas.Solving Means: A calibration method according to this invention is a calibration method for calibrating a. measurement device for measuring a concentration of a gas dissolved in a liquid. In the calibration method, a step (S10) of varying the15 concentration of the gas dissolved in the liquid, and predetermining, as a reference concentration, a concentration of the gas at which an intensity of luminescence produced when the liquid is irradiated with ultrasonic waves shows a peak, is conducted. Next, a step (S20) of measuring a concentration of20 the gas in the liquid with the measurement device to be calibrated when the intensity of the luminescence shows a peak by irradiating the liquid with ultrasonic waves while varying the concentration of the gas in the liquid, to determine a measured value of the concentration of the gas, is conducted. A25 step (S30) of calibrating the measurement device to be calibrated based on the measured value and the reference concentration is conducted_Fig.</p> |
