| 摘要 |
<P>PROBLEM TO BE SOLVED: To achieve high-accurate and efficient focus alignment on two surfaces of a semiconductor substrate with visible light permeability in a defect inspection of the semiconductor substrate. <P>SOLUTION: A defect inspection system comprises: a movable stage that includes a focus aligning mark formed on a front surface; a light source for emitting visible light to the movable stage; an object lens that is provided opposite to the movable stage; a photoelectric conversion element for converting an image formed by the object lens into an electric signal; and a controller for registering a position of the focus aligning mark on the movable stage and thickness of the semiconductor substrate to be inspected, and controlling a positional relationship between the movable stage and the object lens. The controller executes: focus alignment on a rear surface side of the semiconductor substrate on the basis of the registered focus aligning mark; and focus alignment on a front surface side of the semiconductor substrate on the basis of the registered thickness of the semiconductor substrate. <P>COPYRIGHT: (C)2013,JPO&INPIT |
