| 发明名称 |
WET PROCESSING OF MICROELECTRONIC SUBSTRATES WITH CONTROLLED MIXING OF FLUIDS PROXIMAL TO SUBSTRATE SURFACES |
| 摘要 |
The present invention provides methods and apparatuses for controlling the transition between first and second treatment fluids during processing of microelectronic devices using spray processor tools |
| 申请公布号 |
KR20130056872(A) |
申请公布日期 |
2013.05.30 |
| 申请号 |
KR20127030083 |
申请日期 |
2011.04.11 |
| 申请人 |
FSI INTERNATIONAL, INC. |
发明人 |
WAGENER THOMAS J.;BUTTERBAUGH JEFFERY W.;DEKRAKER DAVID |
| 分类号 |
B05B1/02 |
主分类号 |
B05B1/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
