发明名称 METHOD FOR PRODUCING SiC SINGLE CRYSTAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for producing a single crystal, which grows a high-quality SiC single crystal at a high speed. <P>SOLUTION: The method for producing the SiC single crystal includes steps of: (a) preparing SiC powder 2a and C powder 3 or partially carbonized SiC powder as raw material powder; and (b) rapidly growing the SiC single crystal while suppressing a silicon droplet by a sublimation method using the raw material powder after the step (a). It is preferable that the ratio of carbon to silicon in the raw material powder is 1.04-1.14 in the step (a) and a temperature difference between the neighborhood of a crystal growth surface and the neighborhood of the raw material powder is 200&deg;C or more in the step (b). <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013103848(A) 申请公布日期 2013.05.30
申请号 JP20110247041 申请日期 2011.11.11
申请人 MITSUBISHI ELECTRIC CORP 发明人 KOSHO TOMOAKI;TOMITA NOBUYUKI
分类号 C30B29/36 主分类号 C30B29/36
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