| 摘要 |
A cleaning device for cleaning substrates is provided. The device comprises a cleaning brush having an outer cleaning surface surrounding a hollow bore and positioned around a first central axis al defining a first rotational direction alpha; and a plurality of cantilevered nodules formed on the outer cleaning surface, each nodule having a mounting portion connected with the outer cleaning surface, a cleaning portion connected with the mounting portion, and a contact member for engaging the substrate. The cleaning portion extends in a first direction D1 from the mounting portion to the contact member, wherein a radial direction Dr is defined as extending radially from the central axis a1 towards the outer cleaning surface and normal to the rotational direction alpha, and wherein the first direction D1 intersects with the radial direction Dr at an angle gamma. Angle gamma is greater than 0° and less than 180°.
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