| 摘要 |
<P>PROBLEM TO BE SOLVED: To efficiently remove heat of an armature coil. <P>SOLUTION: Heat of an armature coil 38 in a stator 60 constituting a planar motor 50 is transferred to a coolant in a flow channel 71b arranged at the bottom of a surface plate 21 via a heat conduction element 71a provided in a body part 35 of the surface plate 21, and efficiently removed by a cooling device constituting a vapor compression refrigeration cycle by including an evaporator 71 having the flow channel 71b. Thus, fluctuation of the atmosphere around a substrate stage WST on the surface plate 21 is suppressed. Then, high position measurement accuracy of a wafer interferometer to be constituted by using an interferometer is maintained, positioning accuracy of a wafer W (the substrate state WST) is raised, and throughput is improved. <P>COPYRIGHT: (C)2013,JPO&INPIT |
