发明名称 SUBSTRATE PROCESSING METHOD, STORAGE MEDIUM STORING COMPUTER PROGRAM FOR IMPLEMENTING SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
摘要 A chemical liquid process is performed on a substrate. Then, a rinse process that supplies a rinse liquid to the substrate is performed. Thereafter, a drying process that dries the substrate is performed while rotating the substrate. The drying process includes a first drying process that rotates the substrate at a first rotational speed; a second drying process that decreases the rotational speed of the substrate to a second rotational speed lower than the first rotational speed after the first drying process. In the second drying process, the rinse liquid and a drying solution are agitated and substituted while generating braking effect. In a third drying process, the rotational speed of the substrate is increased from the second rotational speed to a third rotational speed after the second drying process. Thereafter, in a fourth drying process, the drying solution on the substrate is scattered away by rotating the substrate.
申请公布号 US2013133695(A1) 申请公布日期 2013.05.30
申请号 US201213687142 申请日期 2012.11.28
申请人 TOKYO ELECTRON LIMITED;TOKYO ELECTRON LIMITED 发明人 MINAMI TERUOMI;TANAKA SATORU;NAGAMATSU TATSUYA;SUZUKI HIROYUKI;KAWABUCHI YOSUKE;HIRAYAMA TSUKASA;MATSUKI KATSUFUMI
分类号 B08B3/04 主分类号 B08B3/04
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