发明名称 MANUFACTURING METHOD OF POWER SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a power semiconductor device capable of improving an isolation voltage and reliability under a high-temperature environment. <P>SOLUTION: By combining an oxygen plasma surface treatment step (step 5) and a preliminary heating process (step 6) before silicone gel injection, adhesiveness between a silicone gel 9 (a protective material), and an insulating substrate 1 having a conductive pattern and a semiconductor chip 2 is improved, thus an isolation voltage and reliability of a power semiconductor device under a high-temperature environment can be improved. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013105761(A) 申请公布日期 2013.05.30
申请号 JP20110246265 申请日期 2011.11.10
申请人 FUJI ELECTRIC CO LTD 发明人 MOMOSE FUMIHIKO;NISHIMURA YOSHITAKA
分类号 H01L21/56;H01L25/07;H01L25/18 主分类号 H01L21/56
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