发明名称 PATTERN FORMING METHOD
摘要 In a pattern forming method, a pattern having at least either a recess or a protrusion of a curable composition is formed of a curable composition by curing the curable composition into a cured film with a mold having a surface provided with at least either a recess or a protrusion, and separating the mold from the curable composition. The method includes (i) forming a gas generation region containing a gas generator agent so that the gas generation region will be disposed in contact with both the mold and the cured film between the mold and the cured film, (ii) generating a gas from the gas generation region, and (iii) separating the mold from the cured film during or after the step of (ii).
申请公布号 US2013137252(A1) 申请公布日期 2013.05.30
申请号 US201213682619 申请日期 2012.11.20
申请人 CANON KABUSHIKI KAISHA;CANON KABUSHIKI KAISHA 发明人 IIDA KENICHI;ITO TOSHIKI
分类号 B05D5/00;H01L21/266;H01L21/308 主分类号 B05D5/00
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