发明名称 |
INTERNAL RINSING IN TOUCHLESS INTERSTITIAL PROCESSING |
摘要 |
Methods and apparatuses are disclosed for rinsing the interface area of a liquid and air boundary after a substrate cleaning process using gas barrier. In some embodiments, a protective chuck having an inner gas ring and an outer liquid ring can be used to clean the area under the edge of the protective chuck. A gas flowing outward from the gas ring can enable a liquid to flow outward from the liquid ring, rinsing the outer portion of the protective chuck. The interface rinsing process can enable combinatorial processing of a substrate, providing multiple isolated processing regions on a single substrate with different material and processing conditions.
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申请公布号 |
US2013134130(A1) |
申请公布日期 |
2013.05.30 |
申请号 |
US201113306821 |
申请日期 |
2011.11.29 |
申请人 |
KELEKAR RAJESH;INTERMOLECULAR, INC. |
发明人 |
KELEKAR RAJESH |
分类号 |
B23B31/02;C23F1/00;F17D1/00 |
主分类号 |
B23B31/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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