发明名称 |
System for Attachment of an Electrode into an Inductively Coupled Plasma Source |
摘要 |
An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
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申请公布号 |
US2013134855(A1) |
申请公布日期 |
2013.05.30 |
申请号 |
US201113307830 |
申请日期 |
2011.11.30 |
申请人 |
KELLOGG SEAN;GRAUPERA ANTHONY;PARKER N. WILLIAM;WELLS ANDREW B.;UTLAUT MARK W.;SKOCZYLAS WALTER;SCHWIND GREGORY A.;ZHANG SHOUYIN;SMITH NOEL;FEI COMPANY |
发明人 |
KELLOGG SEAN;GRAUPERA ANTHONY;PARKER N. WILLIAM;WELLS ANDREW B.;UTLAUT MARK W.;SKOCZYLAS WALTER;SCHWIND GREGORY A.;ZHANG SHOUYIN;SMITH NOEL |
分类号 |
H01J1/02;H05H1/00 |
主分类号 |
H01J1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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