| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method capable of highly accurately forming a fine pattern, for example, even a pattern whose line width is smaller than 50 μm. <P>SOLUTION: A method for forming a fine pattern comprises the steps of: changing a pattern formation region in which a pattern is formed in a first film formed on a substrate and having a hydrophilic/hydrophobic property conversion function to the hydrophilic/hydrophobic property; and forming a second film in the pattern formation region and drying the second film to form a pattern. Viscosity when the thickness of the second film becomes 0.1 μm is less than or equal to 3 mPa s. <P>COPYRIGHT: (C)2013,JPO&INPIT |
