发明名称 SYSTEM AND METHOD FOR REDUCING PARTICLES AND MARKS ON WAFER SURFACE FOLLOWING REACTOR PROCESSING
摘要 In one embodiment, a cleaning chamber is provided. The cleaning chamber has a base portion housing a first chuck, a top portion housing a plurality of cups, and a middle portion functioning as a lid for the base portion and a second chuck for the top portion. A rail couples the top portion and the middle portion, wherein the top portion is rigidly mounted to the rail, while the middle portion is slidably mounted to the rail. A support frame is rigidly mounted to the base portion, the support frame being pivotably affixed to the rail, wherein the rail maintains a vertical alignment between the top portion and the middle portion as the rail pivots.
申请公布号 US2013133704(A1) 申请公布日期 2013.05.30
申请号 US201113305464 申请日期 2011.11.28
申请人 KAHLON SATBIR;EGAMI GLEN;INTERMOLECULAR, INC. 发明人 KAHLON SATBIR;EGAMI GLEN
分类号 B08B3/00;B08B7/04 主分类号 B08B3/00
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