| 摘要 |
<P>PROBLEM TO BE SOLVED: To continuously supply a material matching a deposition amount. <P>SOLUTION: This material supply device for electron beam deposition performs the continuous control of the material 7 when continuously forming a thin film by irradiating the material with an accelerated electron and making the material 7 in a crucible 6 which is heated and deposited adhere on the surface of a board film 2 by detecting an emission current value which is controlled so that an evaporation speed of the material 7 in the crucible 6 may be constant. As the crucible 6, there is employed a crucible whose internal face is formed in a tapered shape of a reversely end-widened shape from a bottom toward an opening end. According to this invention, since a supply amount of the material from the material supply device is automatically controlled and the material matching the deposition amount can be supplied, long-time operation becomes possible. <P>COPYRIGHT: (C)2013,JPO&INPIT |
