ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE COMPOSITION

摘要

Disclosed are an actinic ray-sensitive or radiation-sensitive resin composition including (A) a compound capable of generating an acid by irradiation of actinic rays or radiation, and (B) a resin of which solubility in an alkali developer is increased by being decomposed by the action of an acid, a resist film using the composition, a pattern forming method, an electronic device manufacturing method, and an electronic device, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains a combination composed of the two types of specific compounds of (A-1) or a combination of the two types of specific compounds of (A-2) as the compound (A).