DEFECT INSPECTION METHOD AND DEVICE FOR SAME

摘要

Defect inspection used in the steps for manufacturing a semiconductor or a similar product, wherein: a detection optical system for detecting reflected and scattered light from the sample is provided with a plurality of detectors; a photon-counting detector having a small number of pixels is applied as a detector for detecting the amount of weak background scattered light; an analog detector or a photon-counting detector having a large number of pixels is applied as a detector for detecting the amount of strong background scattered light; and the non-linearity of the detection intensity of scattered light generated by the application of the photon-counting detector is corrected, and the defect-scattered light detection signal is corrected.