| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface-treatment liquid that improves adhesion between a silicon nitride-containing wafer surface and a resist, and a surface-treatment method. <P>SOLUTION: The surface-treatment agent for silicon nitride-containing wafers improves adhesion between the wafer and a resist by hydrophobizing the silicon nitride-containing wafer surface before a resist film formation on the wafer surface. The surface-treatment agent is a silicon compound represented by general formula [1] R<SP POS="POST">1</SP><SB POS="POST">a</SB>SiX<SB POS="POST">4-a</SB>(wherein R<SP POS="POST">1'</SP>s are each mutually independently a hydrogen group or a 1-18C hydrocarbon group and hydrogen atoms of the hydrocarbon group may be substituted with a halogen atom; the total number of carbon atoms contained as R<SP POS="POST">1</SP>is ≥6 in formula [1]; X's are each mutually independently at least one group selected from a monovalent functional group in which the element to be bonded to a silicon element is nitrogen, a monovalent functional group in which the element to be bonded to a silicon element is oxygen and a halogen group; (a) is an integer of 1-3). <P>COPYRIGHT: (C)2013,JPO&INPIT |
