发明名称 FILM FORMING METHOD AND PROCESSING SYSTEM
摘要 A film forming method performs a film forming process on a target object having on a surface thereof an insulating layer. The film forming method includes a first thin film forming step of forming a first thin film containing a first metal, an oxidation step of forming an oxide film by oxidizing the first thin film, and a second thin film forming step of forming a second thin film containing a second metal on the oxide film.
申请公布号 US2013136859(A1) 申请公布日期 2013.05.30
申请号 US201113807079 申请日期 2011.06.24
申请人 MATSUMOTO KENJI;HOSAKA SHIGETOSHI;ITOH HITOSHI;TOKYO ELECTRON LIMITED 发明人 MATSUMOTO KENJI;HOSAKA SHIGETOSHI;ITOH HITOSHI
分类号 B05D5/12 主分类号 B05D5/12
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