| 摘要 |
<P>PROBLEM TO BE SOLVED: To stabilize the quality of a film to be deposited by suppressing the production of particles. <P>SOLUTION: A film deposition apparatus includes: a casing 150; a spraying mechanism having a spray port 130a for pulverizing a film deposition material 160 and spraying it in the casing 150; and a straightening member 132 having an outflow port 132b positioned on the opposite side of an inflow port 132a and the outflow port 132b facing the spray port 130a through a gap 133. A space between the inflow port 132a and the outflow port 132b of the straightening member 132 and the inside of the casing 150 are communicated with each other by the gap 133. <P>COPYRIGHT: (C)2013,JPO&INPIT |
