发明名称 Illumination device for use in microlithographic projection exposure system, has polarization influencing optical element attached to reflecting side surface so that state of polarization of light beam on beam path is differently influenced
摘要 <p>The device (10) has a mirror assembly (200) comprising mirror elements independently adjustable for variation of deflection angle of hitting light. Two reflecting side surfaces (101, 104) are arranged in such a manner that a light beam, reflected at the mirror elements, is guidable on a location in a pupil plane of the device by variation of the deflection angle on over different beam paths. A polarization influencing optical element is attached to each reflecting side surface so that a state of polarization of the light beam on the beam paths is differently influenced. An independent claim is also included for a method for microlithographic manufacturing of microstructured components.</p>
申请公布号 DE102012214198(A1) 申请公布日期 2013.05.29
申请号 DE201210214198 申请日期 2012.08.09
申请人 CARL ZEISS SMT GMBH 发明人 PATRA, MICHAEL
分类号 G03F7/20 主分类号 G03F7/20
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